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Technical program
Prof. Satish G. Kandlikar
Prof. Moo-Hwan Kim

Local Arrangements
Prof. Moo-Hwan Kim

ASME Nanotechnology Institute Contact
Brandy Smith

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Organizers

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Chairs/Committees

 

Track

 

Session

 

Staff Support


Conference Chairs
Satish G. Kandlikar, Rochester Institute of Technology, Rochester, NY, USA
Moo-Hwan Kim, Pohang University of Science and Technology, Pohang, South Korea


Conference Co-Chairs
Gian Piero Celata, Italy
Xin-Gang Liang, Tsinghua University, China
S. Nishio, Japan
Peter Stephan, Germany
Bernard Thonon, France


Scientific Committee Members
Belgium
Oleg A. Kabov, Universite Libre de Bruxelles


Canada
Masahiro Kawaji, University of Toronto, Toronto, Ontario
I. Hassan, Concordia University Montreal, Quebec


China
Z. Y. Guo, Tsighua University
Xin-Gang Liang, Tsinghua University
W.Q. Tao, School of Energy & Power Engineering, Xi'an Jiaotong University
Ping Cheng, Shanghai Jiaotong University


France
Bernard Thonon, CEA, Grenoble
Stéphane Colin, LGMT-INSAT, Toulouse Cedex 4


Germany
T. Gambaryan-Roisman, Technische Universität Darmstadt
S. Hardt, Universität Hannover, Hannover
H. Herwig, TU Hamburg-Harburg, Germany
Norbert Kockmann, Albert-Ludwigs-University Freiburg
Rainer Mertz, Universität Stuttgart, Stuttgart
Peter Stephan, University of Darmstadt, Darmstadt


India
Sushanta Kumar Mitra, IIT Bombay, INdia


Ireland
Mark Davies, University of Limerick


Israel
Gad Hetsroni, Technion


Italy
Gian Piero Celata, ENEA, Rome
Paolo Di Marco, Pisa


Japan
Nobuhide Kasagi, The University of Tokyo, Tokyo
Masahiro Shoji, National Institute of Advanced Industrial Science and Technology, Tsukuba
Yoshio Utaka, Yokohama National University, Yokohama


Korea
Kwang-Hyun Bang, Korea Maritime University, Busan
Moo-Hwan Kim, POSTECH, Pohang
Sang Yong Lee, Korea Advanced Institute of Science and Technology


Mexico
Prof. René Reyes Mazzoco, Universidad De Las Americas Puebla


Poland
M. Poniewski, Kielce University of Technology, Kielce
Magdalena Piasecka, Kielce University of Technology, Kielce


Sweden
Bjorn Palm, Royal Inst. of Technology


Taiwan
Chien-Yuh Yang, National Central University, Chung-Li


United Kingdom
John Rose, University of London, London
Vishwas Wadekar, Aspen Technologies, Oxford
Yuying (Y.Y.) Yan, University of Nottingham, UK


USA
Shih-hui (Joseph) Chao, University of Washington, Seattle, WA
Predrag Hrnjak, University of Illinois at Urbana Champaign, Urbana, IL
Srinivas Garimella, Georgia Institute of Technology, Atlanta, GA
William Grande, Ohmcraft Inc., Honeoye Falls, NY
Nicolas G Hadjiconstantinou, Massachusetts Institute of Technology, Cambridge, MA
Thomas B. Jones, University of Rochester, Rochester, NY
Michael King, University of Rochester, Rochester, NY
D. Li, Vanderbilt University, Nashville, TN
Arun Majumdar, University of California at Berkeley, Berkeley, CA
Shirish Mulay, Lexmark International, Inc., Lexington, KY
Alfonso Ortega, Villanova University
Yoav Peles, Rensselaer Polytechnic Institute, Troy, NY
Pierre Woehl, Corning, Inc., Corning, NY

 
 

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